Intel expects to receive its first next-generation extreme ultraviolet lithography machine, the High-NA EUV, from Dutch manufacturer ASML later this year, a senior executive at the US chipmaker told Reuters on Friday.
"I was in ASML on Monday. We should be getting that (the High-NA EUV) later this year. They're working on putting it all together and getting it ready. So, so far, so good," Ann Kelleher, Intel's general manager of technology development, said in an interview.
"It should be shipped to us later this year. Our expectation is that by late this year, we will have all the various pieces of the machine so that early next year, ASML will be able to start the assembly of it in Oregon," Intel's development site, she said.
